Potomac Adds SU8 Photolithography to Microfabrication Toolbox
Since IBM’s development in 1989 of SU-8 photoresist for use as a key component for high-resolution microelectronics manufacturing, other industries have adopted the photosensitive polymer for a wide range of applications. Whether fabricating microfluidics, micro pillars and cylinders, tiny gears and cantilevers, or optical waveguides, SU-8’s unique material properties expand the capabilities of miniature products. …